发明名称 SURFACE CHEMICAL TREATMENT APPARATUS FOR FINE PATTERNING
摘要 <p>Provided is a surface chemical treatment apparatus for fine patterning that: improves the efficiency of immobilizing molecules, which are dissolved as a solute (32) in a solution (31), on a solid-phase surface (1); and is capable of micronizing an immobilized area by reliably suppressing the spread of the solution (31) at the solid-phase surface (1). This apparatus is configured to be provided with: a first conduit (11), one end of which is open (11a), and the other end of which communicates with a liquid supply means (14); and a second conduit (12), one end of which is open (12a) so as to surround the opening (11a) of the first conduit (11), and the other end of which communicates with a liquid suction means (16). The apparatus is further configured to be provided with a moving mechanism (21) that moves the openings (11a, 12a) of the first and second conduits (11, 12) relative to the solid-phase surface (1), which is a patterning target. By suctioning the patterning solution (31) from the opening (12a) of the second conduit (12), which exists around the opening (11a), together with surrounding liquid phase (2) or gas phase, while discharging the solution (31) from the opening (11a) of the first conduit (11), the solution (31) is prevented from seeping in all directions, enabling surface chemical treatment in fine patterns to be achieved.</p>
申请公布号 WO2014125591(A1) 申请公布日期 2014.08.21
申请号 WO2013JP53492 申请日期 2013.02.14
申请人 SHIMADZU CORPORATION;TOKYO METROPOLITAN UNIVERSITY;WASEDA UNIVERSITY 发明人 UCHIYAMA, KATSUMI;NAKAJIMA, HIZURU;YANG, MING;ZENG, HULIE;SUGAHARA, YOSHIYUKI;NISHIMOTO, TAKAHIRO
分类号 B05C5/02;B01J19/00;B05B15/04 主分类号 B05C5/02
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