发明名称 |
METHOD OF MANUFACTURING FLAKE-LIKE OXIDE SEMICONDUCTOR, METHOD OF MANUFACTURING OXIDE SEMICONDUCTOR FILM, METHOD OF MANUFACTURING THIN-FILM TRANSISTOR, AND METHOD OF FORMING PIXEL ELECTRODE OF LIQUID CRYSTAL DISPLAY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a flake-like oxide semiconductor, a method of manufacturing an oxide semiconductor film, a method of manufacturing a thin-film transistor, and a method of forming a pixel electrode of a liquid crystal display device, capable of forming a high-performance oxide semiconductor film on a substrate at a low temperature.SOLUTION: A method of manufacturing a flake-like oxide semiconductor includes: immersing a substrate having a swelling property to predetermined liquid and having an oxide semiconductor film formed thereon into the liquid, and thereby, peeling the oxide semiconductor film from the substrate; and dispersing the peeled oxide semiconductor film into the liquid to make it flaky. |
申请公布号 |
JP2014150184(A) |
申请公布日期 |
2014.08.21 |
申请号 |
JP20130018647 |
申请日期 |
2013.02.01 |
申请人 |
NIKON CORP |
发明人 |
NAKAZUMI MAKOTO;NISHI YASUTAKA;TAKI YUSUKE |
分类号 |
H01L21/368;C01G9/02;G02F1/1368;G09F9/30;H01L21/336;H01L29/786 |
主分类号 |
H01L21/368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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