INSPECTION METHOD AND INSPECTION APPARATUS

摘要

An inspection method and apparatus comprising, a step of reflecting linearly-polarized light having a predetermined wavelength using an non-polarizing beam splitter after transmitting the linearly-polarized light through a half-wave plate, irradiating a sample with the linearly-polarized light having a polarization plane of a predetermined angle, causing the light reflected by the sample to be incident to an image capturing sensor through a lens, the non-polarizing beam splitter, and an analyzer, and acquiring an optical image of a pattern formed on the sample; acquiring a plurality of optical images by changing an angle of the analyzer or the half-wave plate, and obtaining an angle of the analyzer or the half-wave plate such that a value of (σ/√A) becomes a minimum; and a step of inspecting whether a defect of the pattern exists, wherein the pattern is a repetitive pattern having a period at a resolution limit or less.

主权项

1. An inspection method comprising:
a step of reflecting linearly-polarized light having a predetermined wavelength emitted from a light source using an non-polarizing beam splitter after transmitting the linearly-polarized light through a half-wave plate, irradiating a sample that is an inspection target with the linearly-polarized light having a polarization plane of a predetermined angle, causing the light reflected by the sample to be incident to an image capturing sensor through a lens, the non-polarizing beam splitter, and an analyzer, in this order, and acquiring an optical image of a pattern formed on the sample; a step of acquiring a plurality of optical images by changing an angle of the analyzer or the half-wave plate, and obtaining an angle of the analyzer or the half-wave plate such that a value of (σ/√A), which is obtained from a standard deviation σ of a gray level and an average gray level A in the optical images, becomes a minimum; and a step of inspecting whether a defect of the pattern exists with respect to the optical image that is acquired at the angle of the analyzer or the half-wave plate at which the value of (σ/√A) becomes the minimum, wherein the pattern is a repetitive pattern having a period at a resolution limit or less, the resolution limit being defined by a wavelength of the light source and a numerical aperture of the lens.