Shadow mask attachable on substrate in process chamber of chemical vapor deposition reactor, in which vertical temperature gradient is formed, comprises mask body whose height dimension is less than its surface extension and window

摘要

Shadow mask (3) attachable on a substrate, in a process chamber (2) of a chemical vapor deposition reactor (1), in which a vertical temperature gradient is formed above a substrate carrying at least one susceptor, comprises a mask body (4) whose height dimension is substantially less than its surface extension and at least one window (5), whose edge defines the edge of a deposited layer on the substrate.