发明名称 SEMICONDUCTOR DEVICE
摘要 According to one embodiment, a semiconductor device includes: a semiconductor layer of a first conductivity type, the semiconductor layer having a first surface and a second surface on an opposite side to the first surface; a plurality of conductive layers extending in a direction from the first surface side toward the second surface side of the semiconductor layer; a first semiconductor region of a second conductivity type surrounding part of each of the plurality of conductive layers on the second surface side of the semiconductor layer, a portion other than a front surface of the first semiconductor region being surrounded by the semiconductor layer; and an insulating film provided between each of the plurality of conductive layers and the semiconductor layer and between each of the plurality of conductive layers and the first semiconductor region.
申请公布号 US2014232012(A1) 申请公布日期 2014.08.21
申请号 US201314017454 申请日期 2013.09.04
申请人 Kabushiki Kaisha Toshiba 发明人 Arai Norihisa;Takahashi Tsutomu;Hatakeyama Kazuo;Uchino Kazuki
分类号 H01L23/48 主分类号 H01L23/48
代理机构 代理人
主权项 1. A semiconductor device comprising: a semiconductor layer of a first conductivity type, the semiconductor layer having a first surface and a second surface on an opposite side to the first surface; a plurality of conductive layers extending in a direction from the first surface side toward the second surface side of the semiconductor layer; a first semiconductor region of a second conductivity type surrounding part of each of the plurality of conductive layers on the second surface side of the semiconductor layer, a portion other than a front surface of the first semiconductor region being surrounded by the semiconductor layer; and an insulating film provided between each of the plurality of conductive layers and the semiconductor layer and between each of the plurality of conductive layers and the first semiconductor region.
地址 Minato-ku JP