| 摘要 |
<p>The structure observed on the polished surface in this sintered sputtering target is configured from metal particles and a metal phase in which non-magnetic material particles with an average particle diameter of 1.8μm or less are dispersed and which contains Co or Fe. Defining the maximum diameter as the greatest value of the distance between any two points on the outer periphery of a non-magnetic material particle and the minimum diameter as the smallest value of the distance between two parallel lines when said lines sandwich the same particle, non-magnetic material particles in which the difference between the maximum diameter and the minimum diameter is less than or equal to 0.7μm make up 60% or more of the non-magnetic material particles in the structure observed on the polished surface of the target; and, defining the maximum diameter as the greatest value of the distance between any two points on the outer periphery of a metal particle and the minimum diameter as the smallest value of the distance between two parallel lines when these sandwich the metal particle, there are, in a 1mm2 field of view, on average 1 or more the metal particles for which the sum of the maximum value and the minimum value is 30μm or greater. This sputtering target can suppress abnormal discharge due to non-magnetic materials that cause the generation of particles during sputtering.</p> |
