发明名称 IMAGE SENSOR FOR MITIGATING DARK CURRENT
摘要 One or more embodiments of techniques or systems for mitigating dark current of an image sensor are provided herein. Generally, a silicon interface, such as an edge of a dielectric region or an edge between a back side interface (BSI) region and a pass region, is a source of electrons or holes which cause dark current. In some embodiments, the image sensor includes a surface protect region. For example, the surface protect region is doped with a first doping type and a photo-diode of the image sensor is doped with the same first doping type. In this manner, the surface protect region acts as an electron magnet or a hole magnet for electrons or holes from the silicon interface, thus mitigating electrons or holes from the silicon interface from being collected by the photo-diode, for example.
申请公布号 US2014231949(A1) 申请公布日期 2014.08.21
申请号 US201313769421 申请日期 2013.02.18
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED 发明人 Hung Feng-Chi;Yaung Dun-Nian;Liu Jen-Cheng;Tsai Shu-Ting;Tsai Shuang-Ji
分类号 H01L31/0248 主分类号 H01L31/0248
代理机构 代理人
主权项 1. An image sensor for mitigating dark current, comprising: a first region comprising a first doping type; a second region comprising a second doping type, the second doping type opposite of the first doping type, the first region surrounded by the second region; a silicon interface comprising at least one of an edge between the first region and a dielectric region or an edge between a back side interface (BSI) region and a pass region, the silicon interface located on at least one of a front side of the second region or a back side of the second region; and a surface protect region comprising the first doping type, the surface protect region adjacent to at least one of the silicon interface or the second region, thus mitigating dark current.
地址 Hsin-Chu TW