| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress the generation of a resist residue in a manufacturing method of a semiconductor light emitting element. <P>SOLUTION: An electrode forming process for forming an electrode in a laminated semiconductor layer on a substrate includes an electrode forming mask forming process (S401) for forming an inverse tapered mask with image reverse, an electrode material deposition process (S402), an electrode forming mask lift-off process (S403) and an alkaline cleaning process (S404) by an alkaline solution. Then, a protection layer forming process (S500) for forming a protection layer by covering the laminated semiconductor layer continues. <P>COPYRIGHT: (C)2011,JPO&INPIT |
