| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent the deterioration of the yield of a product by detecting whether a treating liquid is present on a substrate or not with a simple structure. <P>SOLUTION: Static sensors 54A-54C are embedded in a spin chuck 2. The capacitance of the static sensor 54, when the treating liquid is present on a wafer W being the substrate, is made larger than that when the treating liquid is absent on the wafer W. It is detected whether the treating liquid is present or not on the wafer W on the spin chuck 2 by the static sensors 54A-54C. As a result, because abnormality of the discharge of the treating liquid from a treating liquid nozzle 4 or the diffusion of the treating liquid on the substrate is smoothly detected by detecting whether the treating liquid is present or not on the wafer W in a prescribed timing, the abnormality is immediately coped with and the deterioration of the yield of the product is suppressed. <P>COPYRIGHT: (C)2011,JPO&INPIT |
