| 摘要 |
The present invention provides a substrate holding apparatus that comprises: a base part; a support part (81) that is formed on the base part and supports a rear surface of the substrate (P); a first circumferential wall (31) that: is formed on the base part; has a first upper surface that opposes the rear surface of the substrate (P), which is supported by the support part (81); and surrounds a first space (41) that is between the substrate (P), which is supported by the support part (81), and the base part; a second circumferential wall (32) that: is formed on the base part; has a second upper surface that opposes the rear surface of the substrate (P), which is supported by the support part (81), with a gap interposed therebetween; and surrounds the first circumferential wall (31); a third circumferential wall (33) that: is formed on the base part; has a third upper surface that opposes the rear surface of the substrate (P), which is supported by the support part (81); and surrounds the support part (81) and the second circumferential wall (32); a fluid flow port (60) that is capable of supplying gas to a second space (42) that is between the first circumferential wall (31) and the second circumferential wall (32); and a first suction port (61) that suctions fluid from a third space (43) that is between the second circumferential wall (32) and the third circumferential wall (33). |
