发明名称 SYSTEM FOR MEASURING REFRACTION INDEX AND BIREFRINGENCE CHANGES CAUSED BY NONLINEAR EFFECTS IN OPTICAL MATERIAL MICROAREAS
摘要 FIELD: physics, optics.SUBSTANCE: invention relates to optical measurements and is intended for measuring changes in refraction index and birefringence caused by nonlinear effects. The system consists of a femtosecond laser (FS), a photonic optical fibre (SF), two optical channels (KO1, KO2) and an interferometric system, particularly in a form of a VAWI interferometer. The first optical channel (KO1) includes a monochromator (MCR) with a condenser (K) forming the measurement beam. The monochromator (MCR) at the input is connected to the photonic optical fibre (SF). The mirror system of the second optical channel (KO2) includes the moveable mirror (ZP) which changes the optical path length of the second beam in the second optical channel (KO2). The test material (M) is placed in the measurement area situated at the intersection of the measurement beam and the second beam transmitted through the optical channel (KO2).EFFECT: invention increases the accuracy of measuring parameters of optical materials in regions smaller than a few micrometres.5 cl, 1 dwg
申请公布号 RU2525698(C2) 申请公布日期 2014.08.20
申请号 RU20120137705 申请日期 2012.09.04
申请人 INSTYTUT OPTYKI STOSOWANEJ 发明人 GALAS JACEK;LITWIN DARIUSZ;KOZLOWSKI TOMASZ;KRYSZCZYNSKI TADEUSZ
分类号 G01N21/45;G01N21/23 主分类号 G01N21/45
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