Lithographic method and apparatus

摘要

A lithographic method includes controlling a phase adjuster of a lithographic apparatus, the phase adjuster being constructed and arranged to adjust a phase of an electric field of a radiation beam traversing an optical element of the phase adjuster, and controlling a signal provided to the phase adjuster that results in an actual time-temperature characteristic of a portion of the optical element, the control being undertaken with reference to a desired time-temperature characteristic of a portion of the optical element, the control of the signal being such that a change in the actual time-temperature characteristic precedes a related change in the desired time-temperature characteristic.

主权项

1. A lithographic method comprising:
controlling a phase adjuster of a lithographic apparatus, the phase adjuster being constructed and arranged to adjust a phase of an electric field of a radiation beam traversing an optical element of the phase adjuster using a model that provides a desired time-temperature characteristics of a portion of the optical element that at least partially corrects for aberrations generated by the radiation beam traversing a projection system of the lithographic apparatus; and controlling a signal provided to the phase adjuster that results in an actual time-temperature characteristic of the portion of the optical element, the control of the signal being such that a change in the actual time-temperature characteristic precedes a related change in the desired time-temperature characteristic of the portion of the optical element and the actual time-temperature characteristic of the portion of the optical element more closely matches the desired time-temperature characteristics for that portion of the optical element.