发明名称 Laser module manufacturing method and laser module
摘要 An optical semiconductor element is held in a junction-up state at an approach start position that is isolated from a mount face of a planar lightwave circuit, and the top-face height of the optical semiconductor element and the surface height of the planar lightwave circuit are aligned by bringing the optical semiconductor element closer towards the mount face. Further, the height of the active layer of the optical semiconductor element is aligned with the height of a waveguide of the planar lightwave circuit by bringing the optical semiconductor element towards the mount face for an amount of a difference between a reference value of a distance on design from the surface of the planar lightwave circuit to the center of the waveguide and a reference value of a distance on design from the top face of the optical semiconductor element to the center of the active layer.
申请公布号 US8811779(B2) 申请公布日期 2014.08.19
申请号 US201213424489 申请日期 2012.03.20
申请人 NEC Corporation 发明人 Tanaka Hiromasa
分类号 G02B6/12;G02B6/26;G02B6/10;G02B6/42;G02B6/43 主分类号 G02B6/12
代理机构 Young & Thompson 代理人 Young & Thompson
主权项 1. A manufacturing method of a laser module in which an optical semiconductor element constituting a part of the laser module is mounted, via a solder layer, on a mount face that is formed on a planar lightwave circuit by notching a part of the planar lightwave circuit constituting another part of the laser module from a surface on a waveguide forming face side of the planar lightwave circuit towards a normal direction thereof so as to align height of an active layer of the optical semiconductor element and height of a waveguide of the planar lightwave circuit in the normal direction of the waveguide forming face side, the method including: forming the mount face by notching the planar lightwave circuit along depth of a value acquired by adding a reference thickness of the optical semiconductor element on design from the surface on the waveguide forming face side of the planar lightwave circuit where the waveguide is formed, a reference thickness of the solder layer on design, and a difference between a reference value of a distance on design from the surface on the waveguide forming face side of the planar lightwave circuit to the center of the waveguide of the planar lightwave circuit and a reference value of a distance on design from the top face of the optical semiconductor element to the center of the active layer of the optical semiconductor element; holding the optical semiconductor element in a junction-up state at an approach start position isolated from the mount face, and bringing down the optical semiconductor element closer to the mount face to height where top-face height of the optical semiconductor element is aligned with height of the surface on the waveguide forming face side of the planar lightwave circuit; and crushing the solder layer between the mount face and the optical semiconductor element by bringing the optical semiconductor element towards the mount face by a distance that is the difference between the reference value of the distance on design from the surface on the waveguide forming face side of the planar lightwave circuit to the center of the waveguide of the planar lightwave circuit and the reference value of the distance on design from the top face of the optical semiconductor element to the center of the active layer of the optical semiconductor element to mount the optical semiconductor element on the planar lightwave circuit.
地址 Tokyo JP