Apparatus for producing trichlorosilane and method for producing trichlorosilane

摘要

An apparatus for producing trichlorosilane, comprising: a reaction chamber into which the raw gas is introduced to produce a reaction gas; a plurality of heaters disposed inside the reaction chamber to heat the raw gas; and a plurality of electrodes connected to basal portions of the heaters, wherein the heaters include first heaters each having an exothermic portion and second heaters each having an exothermic portion shorter than that of the first heater and a radiation plate connected to the exothermic portion, wherein a partial portion of the exothermic portion of the first heater faces the radiation plate of the second heaters; the reaction chamber has an introducing port of the raw gas on a side of the exothermic portion of the second heater; and the reaction chamber has discharge port of the reaction product gas on a side of the radiation plate of the second heater is arranged.

主权项

1. An apparatus for producing trichlorosilane from a raw gas that includes silicon tetrachloride and hydrogen, comprising:
a reaction chamber into which the raw gas is introduced to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a plurality of heaters that are disposed inside the reaction chamber to heat the raw gas and that are elongated in the vertical direction; and a plurality of electrodes connected to basal portions of the plurality of heaters, wherein the plurality of heaters include first heaters each constituted of a portion defined as a first exothermic portion that generates heat by electrification through the electrodes; and second heaters each having a portion defined as a second exothermic portion that is shorter than that of the first heaters and generates heat by electrification through the electrodes, and a radiation plate that is made of a non-exothermic portion and is connected to an upper end or a lower end of the second exothermic portions of the second heaters, wherein the first heaters and the second heaters are disposed such that a partial portion of the first exothermic portion of the first heaters faces the radiation plates of the second heaters; the reaction chamber has an introducing port of the raw gas on a side to which the second exothermic portions of the second heaters are arranged in positioning relative to the radiation plates of the second heaters; and the reaction chamber has a discharge port of the reaction product gas on a side to which the radiation plates of the second heaters is arranged.