Arrangement for holding a substrate in a material deposition apparatus

摘要

An arrangement (1) for holding a substrate (10) in a material deposition apparatus, which substrate (10) has a deposition side (10a) upon which material (M) is to be deposited, and which arrangement (1) comprises: a shadow mask (20) comprising a number of deposition openings (Di); a support structure (30) comprising a number of surround openings (Si); and a support structure holding means (6) for holding the support mask (30) and/or a substrate holding means (5) for holding the substrate (10), such that the support structure (30) is on the same side as the deposition side (10a) of the substrate (10), and the shadow mask (20) is positioned between the substrate (10) and the support structure (30) such that at least one deposition opening (Di) of the shadow mask (10) lies within a corresponding surround opening (Si) of the support structure (30).

主权项

1. An arrangement for holding a substrate in a material deposition apparatus, which substrate has a deposition side upon which material (M) is to be deposited, and which arrangement comprises
a shadow mask comprising a number of deposition openings; a support structure comprising a number of surround openings; and a support structure holder configured to hold the support structure and/or a substrate holder configured to hold the substrate, such that the support structure is on a same side as the deposition side of the substrate, and the shadow mask is positioned between the substrate and the support structure such that at least one deposition opening of the shadow mask lies within a corresponding surround opening of the support structure, wherein the substrate, shadow mask, and support structure are in direct contact with one another and the substrate is placed onto an ensemble of the support structure and the shadow mask in a frame so that a weight of the substrate is borne by the support structure holder, the support structure and the shadow mask being separate pieces.