发明名称 Method of manufacturing printhead including polymeric filter
摘要 A method of manufacturing a printhead includes providing a substrate and a filter membrane structure. A first portion of the substrate defines a plurality of nozzles and a second portion of the substrate defines a plurality of liquid chambers. Each liquid chamber of the plurality of liquid chambers is in fluid communication with a respective one of the plurality of nozzles. The filter membrane structure is adhered, for example, laminated, to the second portion of the substrate. Each liquid chamber of the plurality of liquid chambers is in fluid communication with a distinct portion of the filter membrane structure. Pores are formed in the filter membrane structure using a photo-lithography process.
申请公布号 US8806751(B2) 申请公布日期 2014.08.19
申请号 US201012767828 申请日期 2010.04.27
申请人 Eastman Kodak Company 发明人 Xie Yonglin;Lebens John A.;Faisst Charles F.
分类号 B21D53/76;B23P17/00 主分类号 B21D53/76
代理机构 代理人 Zimmerli William R.
主权项 1. A method of manufacturing a printhead including a filter comprising: providing a substrate, a first portion of the substrate defining a plurality of nozzles, a second portion of the substrate defining a plurality of liquid chambers, each liquid chamber of the plurality of liquid chambers being in fluid communication with a respective one of the plurality of nozzles; providing a filter membrane structure, the filter membrane structure including a first material layer and a second material layer including a plurality of perimeter chambers, each of the perimeter chambers being in fluid communication with one of the liquid chambers; laminating the filter membrane structure to the second portion of the substrate, each liquid chamber of the plurality of liquid chambers being in fluid communication with a distinct portion of the filter membrane structure; and forming pores in the filter membrane structure using a photo-lithography process, wherein laminating the filter membrane structure to the second portion of the substrate includes laminating the first material layer to the second material layer and laminating the second material layer to the second portion of the substrate, and forming the pores in the filter membrane structure using a photo-lithography process includes forming the pores in the first material layer, and wherein the plurality of perimeter chambers are formed after laminating the second material layer to the second portions and prior to laminating the first material layer to the second material layer.
地址 Rochester NY US