发明名称 Resist composition, method of forming resist pattern, novel compound, and acid generator
摘要 A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R1″-R3″ represents an aryl group or an alkyl group, provided that at least one of R1″-R3″ represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R1″-R3″ may be mutually bonded to form a ring with the sulfur atom; X represents a C3-C30 hydrocarbon group; Q1 represents a carbonyl group-containing divalent linking group; X10 represents a C1-C30 hydrocarbon group; Q3 represents a single bond or a divalent linking group; Y10 represents —C(═O)— or —SO2—; Y11 represents a C1-C10 alkyl group or a fluorinated alkyl group: Q2 represents a single bond or an alkylene group; and W represents a C2-C10 alkylene group).;
申请公布号 US8808959(B2) 申请公布日期 2014.08.19
申请号 US200912591152 申请日期 2009.11.10
申请人 Tokyo Ohka Kogyo Co., Ltd. 发明人 Hada Hideo;Utsumi Yoshiyuki;Seshimo Takehiro;Kawaue Akiya
分类号 G03F7/038;G03F7/039;G03F7/20;G03F7/30 主分类号 G03F7/038
代理机构 Wenderoth, Lind & Ponack, L.L.P. 代理人 Wenderoth, Lind & Ponack, L.L.P.
主权项 1. A resist composition comprising a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, said component (B) comprising an acid generator (B1) comprised of a compound represented by general formula (b1-1) shown below;wherein each of R1″ to R3″ independently represents an aryl group which may have a substituent or an alkyl group which may have a substituent, with the provision that at least one of R1″ to R3″ represents a substituted aryl group having part of the hydrogen atoms substituted with a group represented by general formula (b1-1-0) shown below, and two of R1″ to R3″ may be bonded to each other to form a ring with the sulfur atom; X represents a hydrocarbon group of 3 to 30 carbon atoms which may have a substituent; Q1 represents a divalent linking group containing a carbonyl group; and p represents an integer of 1 to 3:wherein W represents a linear or branched alkylene group of 2 to 10 carbon atoms.
地址 Kanagawa-ken JP