发明名称 |
Resist composition, method of forming resist pattern, novel compound, and acid generator |
摘要 |
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R1″-R3″ represents an aryl group or an alkyl group, provided that at least one of R1″-R3″ represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R1″-R3″ may be mutually bonded to form a ring with the sulfur atom; X represents a C3-C30 hydrocarbon group; Q1 represents a carbonyl group-containing divalent linking group; X10 represents a C1-C30 hydrocarbon group; Q3 represents a single bond or a divalent linking group; Y10 represents —C(═O)— or —SO2—; Y11 represents a C1-C10 alkyl group or a fluorinated alkyl group: Q2 represents a single bond or an alkylene group; and W represents a C2-C10 alkylene group).; |
申请公布号 |
US8808959(B2) |
申请公布日期 |
2014.08.19 |
申请号 |
US200912591152 |
申请日期 |
2009.11.10 |
申请人 |
Tokyo Ohka Kogyo Co., Ltd. |
发明人 |
Hada Hideo;Utsumi Yoshiyuki;Seshimo Takehiro;Kawaue Akiya |
分类号 |
G03F7/038;G03F7/039;G03F7/20;G03F7/30 |
主分类号 |
G03F7/038 |
代理机构 |
Wenderoth, Lind & Ponack, L.L.P. |
代理人 |
Wenderoth, Lind & Ponack, L.L.P. |
主权项 |
1. A resist composition comprising a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure,
said component (B) comprising an acid generator (B1) comprised of a compound represented by general formula (b1-1) shown below;wherein each of R1″ to R3″ independently represents an aryl group which may have a substituent or an alkyl group which may have a substituent, with the provision that at least one of R1″ to R3″ represents a substituted aryl group having part of the hydrogen atoms substituted with a group represented by general formula (b1-1-0) shown below, and two of R1″ to R3″ may be bonded to each other to form a ring with the sulfur atom; X represents a hydrocarbon group of 3 to 30 carbon atoms which may have a substituent; Q1 represents a divalent linking group containing a carbonyl group; and p represents an integer of 1 to 3:wherein W represents a linear or branched alkylene group of 2 to 10 carbon atoms. |
地址 |
Kanagawa-ken JP |