Method of manufacturing surface emitting laser, and surface emitting laser, surface emitting laser array, optical scanning device and image forming apparatus

摘要

A disclosed method of manufacturing a surface emitting laser includes laminating a transparent dielectric layer on an upper surface of a laminated body; forming a first resist pattern on an upper surface of the dielectric layer, the first resist pattern including a pattern defining an outer perimeter of a mesa structure and a pattern protecting a region corresponding to one of the relatively high reflection rate part and the relatively low reflection rate part included in an emitting region; etching the dielectric layer by using the first resist pattern as an etching mask; and forming a second resist pattern protecting a region corresponding to an entire emitting region. These steps are performed before the mesa structure is formed.

主权项

1. A method of manufacturing a surface emitting laser, the surface emitting laser including:
a laminated body in which a lower reflection mirror, a resonance structure, and an upper reflection mirror are laminated on a substrate, the resonance structure including an active layer, the upper reflection mirror including a selectively-oxidized layer, and a mesa structure formed in the laminated body and providing an emitting section, the emitting section including a current confined structure and an emitting region, the current confined structure including an oxide surrounding a current passage region, the emitting region including a relatively high reflection rate part and a relatively low reflection rate part, the method comprising: a first dielectric layer laminating step of laminating a first transparent dielectric layer on an upper surface of the laminated body; and a resist pattern forming step of forming first and second resist patterns simultaneously on an upper surface of the first transparent dielectric layer, wherein the first resist pattern includes a pattern configured to define an outer perimeter of the mesa structure and a pattern configured to protect a region corresponding to one of the relatively high reflection rate part and the relatively low reflection rate part included in the emitting region, and wherein the second resist pattern is configured to protect a region corresponding to all of the emitting region, wherein the first dielectric layer laminating step and the resist pattern forming step are performed before the mesa structure is formed.