Method of forming pattern

摘要

According to one embodiment, there is provided a method of forming a pattern including forming a polymer layer on a substrate, the polymer layer including a first and second regions, selectively irradiating either of the first and second regions with energy rays or irradiating the first and second regions with energy rays under different conditions to cause a difference in surface free energy between the first and second regions, thereafter, forming a block copolymer layer on the polymer layer, and causing microphase separation in the block copolymer layer to simultaneously form first and second microphase-separated structures on the first and second regions, respectively.

主权项

1. A method of forming a pattern, comprising:
forming a polymer layer on a substrate, the polymer layer including first and second regions, wherein the first region is to be patterned in a later step and the second region is not to be patterned in a later step; selectively irradiating either of the first and second regions with energy rays or irradiating the first and second regions with energy rays under different conditions to cause a difference in surface free energy between the first and second regions; forming a block copolymer layer on the polymer layer, the block copolymer layer including a block copolymer containing first and second block chains different from each other; and causing microphase separation in the block copolymer layer to simultaneously form first and second microphase-separated structures on the first and second regions, respectively, the first microphase-separated structure on the first region comprising a lamellar phase in which a first block chain layer and a second block chain layer are formed perpendicularly to the substrate and alternately arranged, and the second microphase-separated structure on the second region comprising a lamellar phase in which a first block chain layer and a second block chain layer are formed parallel to the substrate and alternately stacked.