| 摘要 |
Disclosed is a plating rack device for plating a substrate. The plating rack device comprises a rack main body having a substrate; a rotation operating shaft having a pushing tool, installed to be able to rotate around a shaft line in the rack main body, and formed to be fixed to the rack main body by pushing a circumference part of the substrate by the pushing tool when rotation is operated; and a rotation hook formed to prevent the rotation of the rotation operating shaft in a state capable of fixing or releasing the substrate while being stuck and in contact according to the rotation angle of the rotation operating shaft. The rotation hook includes an arm installed in one side of the rotation operating shaft, and moving toward the direction of rotation operation; and a hook having a hook groove corresponding to the arm, arranged in the rack main body, and formed to be stuck or released while the end of the arm is stuck to or running over the hook groove according to the rotation operation angle of the rotation operating shaft. |
