Sub-resolution assist feature arranging method and computer program product and manufacturing method of semiconductor device

摘要

According to a sub-resolution assist feature arranging method in embodiments, it is selected which of a rule base and a model base is set for which pattern region on pattern data corresponding to a main pattern as a type of the method of arranging the sub-resolution assist feature for improving resolution of the main pattern formed on a substrate. Then, the sub-resolution assist feature by the rule base is arranged in a pattern region set as the rule base and the sub-resolution assist feature by the model base is arranged in a pattern region set as the model base.

主权项

1. A sub-resolution assist feature arranging method comprising:
selecting a rule-based region within a main pattern defined by pattern data, the rule-based region being a region in which sub-resolution assist features are arranged according to a rule in a rule base; selecting a model-based region within the main pattern, the model-based region being a region in which sub-resolution assist features are arranged to a model in a model base; arranging a first sub-resolution assist feature by the rule base in the rule-based region as a rule-based sub-resolution assist feature; and arranging a second sub-resolution assist feature by the model base in the model-based region as a model-based sub-resolution assist feature, wherein a space region between the rule-based region and the model-based region is set to have a predetermined width such that:
a degree of effect of the rule-based sub-resolution assist feature on a resolution of the main pattern arranged in the model-based region is smaller than a first predetermined value, anda degree of effect of the model-based sub-resolution assist feature on a resolution of the main pattern arranged in the rule-based region is smaller than a second predetermined value.