Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning process

摘要

An aralkylcarbamate of imidazole base is effective as the quencher. In a chemically amplified positive resist composition comprising the carbamate, deprotection reaction of carbamate takes place by reacting with the acid generated upon exposure to high-energy radiation, whereby the composition changes its basicity before and after exposure, resulting in a pattern profile with advantages including high resolution, rectangular shape, and minimized dark-bright difference.

主权项

1. A chemically amplified positive resist composition comprising:
(A) a nitrogen-containing organic compound having the general formula (3): wherein R1 is hydrogen, a straight, branched or cyclic C1-C15 alkyl group, or C6-C15 aryl group, R4 is an optionally alkoxy-substituted C6-C15 aryl group, and R10 and R11 are each independently hydrogen or C1-C6 alkyl, as a quencher, (B) an organic solvent, (C) a base resin which changes its solubility in alkaline developer under the action of an acid, and (D) a photoacid generator.