| 发明名称 | Photoresist composition and method of manufacturing array substrate using the same | ||
| 摘要 | A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent. | ||
| 申请公布号 | US8808963(B2) | 申请公布日期 | 2014.08.19 |
| 申请号 | US201113050522 | 申请日期 | 2011.03.17 |
| 申请人 | Samsung Display Co., Ltd.;AZ Electronic Materials (KOREA) Ltd. | 发明人 | Lee Hi-Kuk;Yun Sang-Hyun;Lee Min-Soo;Kang Deok-Man;Oh Sae-Tae;Choi Jae-Young |
| 分类号 | G03C1/76 | 主分类号 | G03C1/76 |
| 代理机构 | H.C. Park & Associates, PLC | 代理人 | H.C. Park & Associates, PLC |
| 主权项 | 1. A photoresist composition, comprising: a binder resin; a photo acid generator; an acryl resin represented by Chemical Formula 1; and a solvent, wherein R1, R2, R3, R4, and R5 each represent a hydrogen atom or an alkyl group having 1-4 carbon atoms, and a, b, d, and e each represent a value in a range of about 0.01 to about 0.99, and the sum of a, b, d, and e is 1. | ||
| 地址 | Yongin KR | ||