PHASE SHIFT BLANKMASK AND METHOD FOR FABRICATING OF THE SAME

摘要

Provided in the present invention is a phase shift blank mask for an FPD forming a phase shifting film on a transparent substrate and carrying out at least one process among the surface treatment using the surface treatment and thermal treatment process of the phase shifting film using a plasma process. Accordingly, according to the surface treatment, chemical resistance, oxidation resistance, and uniformity are improved for a chemical used in a washing process and an etching material used in a patterning process to form a phase shifting film having a low phase difference and a low change in transmittance, thus a phase shift photo mask for a FPD having a fine pattern can be manufactured.