| 摘要 |
The invention relates to a method for the conditioning of flat objects such as silicon substrates.;The objects, obtained by sawing from a block form a comb like structure by being fixed with one edge to a plate shaped fixation apparatus, are conditioned by conventional rinsing, separating and wet chemical treatment, wherein the treatment takes place before the separation of the sawed substrates from the fixation apparatus.;An apparatus which is suitable for carrying out the method has two regions arranged parallel to the apparatus longitudinal axis (L) and above one another, wherein the upper region is configured as an adapter region (1). The lower region is formed as a holding region (2) which comprises a part, provided as a channel (11), of a circumferentially closed or closable channel system which can be supplied with liquid by means of closable supply openings (5). The bottom of this channel (11) is opened in a slot-like fashion during the sawing of the substrate block so as to provide passage openings (15) for the treatment liquid, and it is subdivided into a plurality of sections (11A, 11B) along the apparatus longitudinal axis (L). |
