发明名称 Mirror assembly for lighting system of lithographic exposure apparatus, has mirror segments with edges that are extended in direction of second dimension which is greater than first dimension of mirror segment
摘要 <p>The mirror assembly (10) has a segmented mirror (12) that is provided with mirror segments (14a-14e). The mirror segments with respect to a plane are spanned by first and second dimensions, and are arranged next to one another. The edges (17,18) of mirror segments are extended in a direction of second dimension, and are arranged in pairs adjacent to each other. The mirror segment is tilted by tilt axis (22a-22d). The second dimension (Ay) of mirror segments is greater by a factor of 10 than first dimension (Ax), and tilting axis is extended in parallel to second dimension. An independent claim is included for a method for operating mirror assembly.</p>
申请公布号 DE102013214242(A1) 申请公布日期 2014.08.14
申请号 DE201310214242 申请日期 2013.07.22
申请人 CARL ZEISS SMT GMBH 发明人 WOLF, ALEXANDER;SCHWAB, MARKUS;GRUNER, TORALF;HARTJES, JOACHIM
分类号 G02B26/08;G02B5/09;G02B7/198;G03F7/20 主分类号 G02B26/08
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