| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma light source from which extreme-ultraviolet light of high intensity can be stably obtained for a long time.SOLUTION: The plasma light source comprises: a pair of coaxial electrodes 10, 10 which are disposed while facing each other, generate plasma radiating extreme-ultraviolet light therebetween and encapsulate the plasma; a voltage application device 30 which applies discharge voltages of the same polarity to the coaxial electrodes 10; and a laser device 60. On a side surface of a center electrode 12 in each of the coaxial electrodes 10, metal layers 27a, 27b are formed as a plasma medium region. The laser device 60 irradiates the metal layer 27a with laser light 64 to perform aberration, discharges a plasma medium, further irradiates the metal layer 27b with laser light 65 in accordance with the progress of planar discharge generated by the laser light 64 to perform aberration, and supplies the plasma medium to the planar discharge. |
