发明名称 |
X-RAY REFLECTOR AND MANUFACTURING METHOD THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To solve a problem caused when a silicon base plate is plastically deformed by press working under high temperature so as to be curved, in an X-ray reflector and a manufacturing method of the X-ray reflector.SOLUTION: A manufacturing method of an X-ray reflector includes: a step of providing a plurality of holes which penetrate from one surface to the other surface of a silicon base plate and whose side walls are used as X-ray reflection surfaces to the silicon base plate; and a step of plating one surface of the silicon base plate having the plurality of holes with a metal thin film so as to curve the silicon base plate by the stress of the metal thin film. |
申请公布号 |
JP2014145659(A) |
申请公布日期 |
2014.08.14 |
申请号 |
JP20130014320 |
申请日期 |
2013.01.29 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL &, TECHNOLOGY;TOKYO METROPOLITAN UNIV |
发明人 |
KURASHIMA YUICHI ; HIROSHIMA HIROSHI ; ITO HISAHIRO ; MAEDA RYUTARO ; TAKAGI HIDEKI ; IKEHARA TAKESHI ; EZOE YUICHIRO |
分类号 |
G21K1/06;G01T1/29;G21K1/00;G21K7/00 |
主分类号 |
G21K1/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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