发明名称 X-RAY REFLECTOR AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To solve a problem caused when a silicon base plate is plastically deformed by press working under high temperature so as to be curved, in an X-ray reflector and a manufacturing method of the X-ray reflector.SOLUTION: A manufacturing method of an X-ray reflector includes: a step of providing a plurality of holes which penetrate from one surface to the other surface of a silicon base plate and whose side walls are used as X-ray reflection surfaces to the silicon base plate; and a step of plating one surface of the silicon base plate having the plurality of holes with a metal thin film so as to curve the silicon base plate by the stress of the metal thin film.
申请公布号 JP2014145659(A) 申请公布日期 2014.08.14
申请号 JP20130014320 申请日期 2013.01.29
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL &amp, TECHNOLOGY;TOKYO METROPOLITAN UNIV 发明人 KURASHIMA YUICHI ; HIROSHIMA HIROSHI ; ITO HISAHIRO ; MAEDA RYUTARO ; TAKAGI HIDEKI ; IKEHARA TAKESHI ; EZOE YUICHIRO
分类号 G21K1/06;G01T1/29;G21K1/00;G21K7/00 主分类号 G21K1/06
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