| 摘要 |
C :NRhflbTDCC/ThR42652I.DOC-1IM)4flOI2 Plasma devices (910) and methods for using such plasma devices (910) in analytical measurements are disclosed. In certain examples, a low flow plasma may be operative using a total argon gas flow of less than about five liters per minut and in some 5 embodiments, a plasma argon gas flow of less than about four liter per minute. In other examples, a plasma produced using inductive (920) and capacitive (930, 940) coupling is disclosed. T- it 0))0 0)0 0) 0 0) 0)) |
