发明名称 Non-volatile memory device, method of fabricating the same, and processing system comprising the same
摘要 <p>A nonvolatile memory device, a method of fabricating the nonvolatile memory device and a processing system including the nonvolatile memory device. The nonvolatile memory device may include a plurality of internal electrodes that extend in a direction substantially perpendicular to a face of a substrate, a plurality of first external electrodes that extend substantially in parallel with the face of the substrate, and a plurality of second external electrodes that also extend substantially in parallel with the face of the substrate. Each first external electrode is on a first side of a respective one of the internal electrodes, and each second external electrode is on a second side of a respective one of the internal electrodes. These devices also include a plurality of variable resistors that contact the internal electrodes, the first external electrodes and the second external electrodes.</p>
申请公布号 KR101418434(B1) 申请公布日期 2014.08.14
申请号 KR20080023416 申请日期 2008.03.13
申请人 发明人
分类号 H01L27/115 主分类号 H01L27/115
代理机构 代理人
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