PROCESS FOR OBTAINING METALOXIDES BY LOW ENERGY LASER PULSES IRRADIATION OF METAL FILMS

摘要

The present invention relates to processes for obtaining metal oxides by irradiation of low energy laser pulses of metal layers, wherein said metals can be formed as simple metals, alloys, or multilayers. The present invention performs the oxidation of a thin metal film deposited on a substrate; e.g., glass (SiO2) or silicon (Si) by a laser-irradiation time of a few nanoseconds to femtoseconds at high repetition rate, time necessary to achieve a stoichiometry and a well-defined microscopic structure. Through the processes of the invention, it is possible to obtain complex structures and metal oxides at room temperature in a very short time and with very low energy consumption.

主权项

1. A process for obtaining metallic oxides by irradiation of metal films with low energy laser pulses, wherein the process comprises the steps of:
a) Depositing a metal film on a substrate, and b) Irradiating at least a portion of the surface of said metal film with ultrashort laser pulses at a very high repetition rate.