| 摘要 |
A pattern-forming method includes forming a resist underlayer film on a substrate using a resist underlayer film-forming composition. The resist underlayer film-forming composition includes a base component, and a crosslinking agent. A content of hydrogen atom in the resist underlayer film is from 0 to 50 atom %. The crosslinking agent has a partial structure represented by a following general formula (i). X represents an oxygen atom, a sulfur atom, or —NR—. R represents a hydrogen atom, an alkyl group having 1 to 9 carbon atoms, or an aryl group having 6 to 30 carbon atoms. n1 is an integer from 1 to 6. R1 represents a hydrogen atom, an alkyl group having 1 to 9 carbon atoms, or an aryl group having 6 to 30 carbon atoms.; |
| 主权项 |
1. A pattern-forming method comprising:
forming a resist underlayer film on a substrate using a resist underlayer film-forming composition; forming an intermediate layer on the resist underlayer film; applying a resist composition to the resist underlayer film on which the intermediate layer is formed to form a resist film; exposing the resist film by selectively applying radiation to the resist film; developing the exposed resist film to form a resist pattern; and dry-etching the intermediate layer, the resist underlayer film, and the substrate using the resist pattern as a mask to form a given pattern on the substrate, the resist underlayer film-forming composition comprising: a base component; and a crosslinking agent having a partial structure represented by a following general formula (i), a content of hydrogen atom in the resist underlayer film being from 0 to 50 atom %,wherein
X represents an oxygen atom, a sulfur atom, or —NR—, wherein R represents a hydrogen atom, an alkyl group having 1 to 9 carbon atoms, or an aryl group having 6 to 30 carbon atoms, and in a case where a plurality of X are present, each of the plurality of X is either identical or different, n1 is an integer from 1 to 6, and R1 represents a hydrogen atom, an alkyl group having 1 to 9 carbon atoms, or an aryl group having 6 to 30 carbon atoms, wherein in a case where a plurality of R1 are present, each of the plurality of R1 is either identical or different. |
