INSPECTION APPARATUS OF REFLECTION TYPE MASK, EXPOSURE APPARATUS, METHOD FOR INSPECTING REFLECTION TYPE MASK, AND EXPOSURE METHOD

摘要

PROBLEM TO BE SOLVED: To provide an inspection apparatus of a reflection type mask, with which the reflection type mask can be inspected in-line without damaging a pattern region of the reflection type mask.SOLUTION: An inspection apparatus of a reflection type mask includes: a shielding plate 21 which is arranged so as to cover the reflection type mask 30 having a pattern region with a light exposure pattern and an inspection region 32 arranged on a position different from that of the pattern region and which has a pattern opening formed on a position corresponding to the pattern region and an inspection opening 23 formed on a position corresponding to the inspection region 32; and a light-receiving section 26 to receive light reflected by the inspection region 32, and allows light to advance from a side opposite to the reflection type mask 30 with respect to the shielding plate 21 toward the reflection type mask 30 through the inspection opening 23, however, does not allow light to advance from a side of the reflection type mask 30 with respect to the shielding plate 21 toward the side opposite to the reflection type mask 30 through the inspection opening 23.