发明名称 |
EVALUATION DEVICE OF CHARGED PARTICLE BEAM DEVICE, AND CHARGED PARTICLE BEAM DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide an evaluation device of a charged particle beam device which can evaluate measurement error based on adhesion of contamination with high precision, and to provide a charged particle beam device. ! SOLUTION: An evaluation device of a charged particle beam device for measuring a pattern on a sample calculates the difference between a first measurement result of the pattern, and a second measurement result of the pattern, obtained by irradiating a charged particle beam for a predetermined time after obtaining the first measurement result, and then outputs the evaluation result of the charged particle beam device based on an evaluation value obtained based on the difference. A charged particle beam device is also provided. ! COPYRIGHT: (C)2014,JPO&INPIT |
申请公布号 |
JP2014146523(A) |
申请公布日期 |
2014.08.14 |
申请号 |
JP20130014972 |
申请日期 |
2013.01.30 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
KUDO TOMOHIRO ; KITSUNAI HIROYUKI ; SATO OSAMU ; KOBAYASHI MASAYUKI |
分类号 |
H01J37/28;G01B15/00;G01B15/04 |
主分类号 |
H01J37/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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