发明名称 EVALUATION DEVICE OF CHARGED PARTICLE BEAM DEVICE, AND CHARGED PARTICLE BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an evaluation device of a charged particle beam device which can evaluate measurement error based on adhesion of contamination with high precision, and to provide a charged particle beam device. ! SOLUTION: An evaluation device of a charged particle beam device for measuring a pattern on a sample calculates the difference between a first measurement result of the pattern, and a second measurement result of the pattern, obtained by irradiating a charged particle beam for a predetermined time after obtaining the first measurement result, and then outputs the evaluation result of the charged particle beam device based on an evaluation value obtained based on the difference. A charged particle beam device is also provided. ! COPYRIGHT: (C)2014,JPO&INPIT
申请公布号 JP2014146523(A) 申请公布日期 2014.08.14
申请号 JP20130014972 申请日期 2013.01.30
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 KUDO TOMOHIRO ; KITSUNAI HIROYUKI ; SATO OSAMU ; KOBAYASHI MASAYUKI
分类号 H01J37/28;G01B15/00;G01B15/04 主分类号 H01J37/28
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