Novel Lithographic Method with the Capability of Spectrum Engineering to Create Complex Microstructures

摘要

The present invention relates to a method for microstructuring a substrate. In the method according to the invention a substrate with a region to be structured is provided, and then by applying colloid spheres into this region, a colloid sphere monolayer is formed. The thus applied colloid sphere monolayer exhibits a certain geometrical symmetry. Said colloid sphere monolayer is then illuminated with a beam of spatially modulated intensity distribution synchronized to said monolayer, thereby performing mechanical structuring in said region in conformity with a desired pattern through concentrating beam intensity via near-field effect behind said colloid sphere monolayer in the propagation direction of light.

主权项

1. Method to provide a substrate with microstructure, wherein a substrate with a region to be structured is provided, comprising the steps of
forming a colloid sphere monolayer by applying colloid spheres into said region, said colloid sphere monolayer exhibiting a given geometrical symmetry; and illuminating said colloid sphere monolayer with a beam of spatially modulated intensity distribution, thereby performing mechanical structuring in said region in accordance with a desired pattern through concentrating beam intensity via near-field effect behind said colloid sphere monolayer in the propagation direction of light.