| 摘要 |
The invention relates to a device for wet-treating flat substrates (S1, S2) by wetting the lower face with a fluid. The device includes at least one wetting station (B A, BB) with at least one wetting roller (W A, W B) for wetting the lower face of the substrate to be treated using a fluid, said substrate being moved over the treatment roller in a transport direction (TR). The device also includes a roller transport system that has multiple transport rollers (T1 to T7, W A, W B) which are arranged one behind the other in a spaced manner in the transport direction and which include the at least one wetting roller. According to the invention, the wetting roller is arranged at a height level (Hm) which lies higher than a height level (Hu) defined by a roller transport system portion adjoining the wetting roller on the feed side by a specified height offset (AH A). |
