| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad which hardly deteriorates due to water absorption in a hygroscopic environment, is excellent in polishing characteristics and life characteristics and has high polishing speed, and to provide a method of manufacturing the polishing pad.SOLUTION: The polishing pad has a polishing layer 1 comprised of a polyurethane foam with minute air bubbles, the polyurethane foam is a reaction cured body of an isocyanate terminal prepolymer, aliphatic diol and a chain extender, the isocyanate terminal prepolymer being obtained by reacting a prepolymer raw material composition containing an isocyanate component, high molecular weight polyol and aliphatic diol. The high molecular weight polyol contains polyalkylene glycol A having a molecular weight distribution peak in the range of 200 to 300, and polyalkylene glycol B having a molecular weight distribution peak in the range of 800 to 1,200. |
