发明名称 |
MANUFACTURING METHOD FOR OPTICAL COMPENSATION FILM |
摘要 |
A method for manufacturing a novel tilt alignment type optical compensation film formed using a non-liquid crystal polymer material, instead of a conventional tilt alignment type optical compensation film using a liquid crystal material. The method for manufacturing including: melting a non-liquid crystal polymer to prepare a molten resin; applying a shear force to the melted non-liquid crystal polymer by a shear force application device, thereby forming a film having an optical axis that tilts with respect to a thickness direction of the film; and stretching the film. The step of forming the film is carried out under conditions where a temperature T3 of the melted non-liquid crystal polymer, a glass transition point Tg of the non-liquid crystal polymer, and a temperature T2 of the shear force application device satisfy relationships represented by the following formulae (A) and (B):;T3>Tg+25° C.; and (A);T3>T2. (B) |
申请公布号 |
US2014225288(A1) |
申请公布日期 |
2014.08.14 |
申请号 |
US201214233499 |
申请日期 |
2012.07.04 |
申请人 |
Haida Nobuyuki;Yaginuma Hironori;Murakami Nao;Kawasaki Motoko;Seike Kunihiro;Ehara Keigo;Yamamoto Shogo |
发明人 |
Haida Nobuyuki;Yaginuma Hironori;Murakami Nao;Kawasaki Motoko;Seike Kunihiro;Ehara Keigo;Yamamoto Shogo |
分类号 |
G02B5/30 |
主分类号 |
G02B5/30 |
代理机构 |
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代理人 |
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主权项 |
1. A method for manufacturing an optical compensation film comprising
melting a non-liquid crystal polymer to prepare a molten resin; forming a film having an optical axis that tilts with respect to a thickness direction of the film by applying a shear force to the melted non-liquid crystal polymer by a shear force application device; and stretching the film, wherein the step of forming, the film is carried out under conditions where a temperature T3 of the melted non-liquid crystal polymer, a glass transition point Tg of the non-liquid crystal polymer, and a temperature T2 of the shear force application device satisfy relationships represented by the following formulae (A) and (B):
T3>Tg+25° C.; and (A)T3>T2. (B) |
地址 |
Ibaraki-shi JP |