发明名称 POLYURETHANE, COMPOSITION FOR FORMATION OF POLISHING LAYERS THAT CONTAINS SAME, PAD FOR CHEMICAL MECHANICAL POLISHING, AND CHEMICAL MECHANICAL POLISHING METHOD USING SAME
摘要 A polyurethane is produced by reacting a mixture including at least (A) a diisocyanate, (B) a polyol, and (C) a chain extender, the polyol (B) having the number average molecular weight of 400 to 5000, the chain extender (C) including (C1) a compound shown by the following general formula (1) and (C2) a compound shown by the following general formula (2), the compound (C1) and the compound (C2) having a number average molecular weight of less than 400, and a ratio “M1/(M1+M2)” calculated by using the number of moles (M1) of the compound (C1) and the number of moles (M2) of the compound (C2) being 0.25 to 0.9.;HO—(CR1R2)2m+1—OH  (1);HO—(CR3R4)2n—OH  (2)
申请公布号 US2014223832(A1) 申请公布日期 2014.08.14
申请号 US201414254395 申请日期 2014.04.16
申请人 JSR CORPORATION 发明人 OKAMOTO Takahiro;Kuwabara Rikimaru
分类号 B24B37/24 主分类号 B24B37/24
代理机构 代理人
主权项
地址 Tokyo JP