发明名称 |
PLASMA ETCHING APPARATUS AND DEVICE FOR SUBSTRATE TRANSFER |
摘要 |
Disclosed are a plasma etching apparatus and a substrate transferring apparatus. The plasma etching apparatus includes a stage on which a substrate is fixed, a plurality of support units which are arranged on the lower side of the stage and support the stage, and a driving unit which is connected to the support units and moves the stage. |
申请公布号 |
KR20140100360(A) |
申请公布日期 |
2014.08.14 |
申请号 |
KR20130013582 |
申请日期 |
2013.02.06 |
申请人 |
KODI-S CO., LTD. |
发明人 |
PARK, CHAN JUNG;CHOI, JUN HO;MOON, HEE SEOK |
分类号 |
H01L51/56;H01L21/3065;H05B33/10 |
主分类号 |
H01L51/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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