SUBSTRATE TREATMENT METHOD, PROGRAM AND COMPUTER STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To arrange a hydrophilic polymer and a hydrophobic polymer into a desired pattern by appropriately forming a guide on a substrate in a substrate treatment method using a block copolymer containing the hydrophilic polymer and the hydrophobic polymer.SOLUTION: An antireflection film 402 is formed on a first resist film 401 that is soluble with an alkali solution and deprotected, both films being formed on an upper surface of a neutral layer 400 on a wafer W; and a resist pattern is formed in a second resist film 403 formed on the antireflection film 402. Then a predetermined pattern is formed in the neutral layer 400 by using the resist pattern of the second resist film 403 as a mask. Then the first resist film 401 is removed by use of an alkali solution. A black copolymer is applied on the wafer W after the first resist film 401 is removed; and the black copolymer is separated into phases of the hydrophilic polymer and the hydrophobic polymer.