N-TYPE DIFFUSION LAYER FORMATION COMPOSITION, MANUFACTURING METHOD OF N-TYPE DIFFUSION LAYER, AND MANUFACTURING METHOD OF SOLAR CELL ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide an n-type diffusion layer formation composition capable of efficiently forming an n-type diffusion layer on a specific part without forming an unnecessary n-type diffusion layer in a manufacturing step of a solar cell element using a silicon substrate, a manufacturing method of the n-type diffusion layer, and a manufacturing method of the solar cell element.SOLUTION: The n-type diffusion layer formation composition contains: a glass powder containing a donor chemical element and having a softening temperature of 300°C to 950°C; and a dispersion medium. By coating the n-type diffusion layer formation composition and performing a thermal diffusion treatment, an n-type diffusion layer and a solar cell element having the same are manufactured.