发明名称 Inspection Device and Inspection Method
摘要 Provided are an inspection device and an inspection method capable of achieving improved magnetic field sensitivity by using a magnetic thin film of a small film thickness. A light-emitting unit 1 emits light of a first wavelength for acquiring magnetic field inspection information and a second wavelength for acquiring inspection object surface information. A selection unit 6 selects information from an inspection object 4 and information from a magnetophotonic crystal film 3 acquired by light irradiation performed by an irradiation unit 2. An image generation unit 9 generates image data based on the magnetic field inspection information acquired with the first wavelength and the inspection object surface information acquired with the second wavelength selected by the selection unit. Each of the generated image data is displayed on a display unit 10.
申请公布号 US2014225606(A1) 申请公布日期 2014.08.14
申请号 US201414177965 申请日期 2014.02.11
申请人 Hitachi, Ltd. 发明人 ENDO Hisashi;NARISHIGE Soshi;INOUE Mitsuteru;TAKAGI Hiroyuki
分类号 G01N27/82;G01N27/72 主分类号 G01N27/82
代理机构 代理人
主权项 1. An inspection device for evaluating characteristic changes in an inspection object such as flaws and material property changes by using magnetism, wherein the inspection device employs a magnetophotonic crystal film.
地址 Tokyo JP