| 摘要 |
In the present invention, a first insulating film (61) is formed with a recess portion (62) left therein in a contact hole (54), and the contact hole is surrounded by a first line pattern (52) and a second line pattern (53), the first line pattern and the second line pattern having different heights. The recess portion (62) is filled so as to form a first mask film (63), and the first insulating film (61) except for the recess portion (62) is etched back so as to be removed, thereby forming a second contact hole (64). After that, a conductive material is implanted in the second contact hole (64), and the top surface of the first line pattern (52) having a low height is exposed, thereby forming a contact plug. |
