| 发明名称 |
PHOTOSENSITIVE MATERIAL, HOLOGRAPHIC MEDIUM AND HOLOGRAPHIC RECORDING METHOD |
| 摘要 |
<p>A photosensitive material includes: a polymer matrix, a radical polymerization monomer and photo-radical polymerization initiator, wherein the polymer matrix has stable nitroxy radical at side chain thereof, wherein a molar ratio of the stable nitroxy radical to the radical polymerization monomer is set within a range of 0.03 to 0.25.</p> |
| 申请公布号 |
KR20140100513(A) |
申请公布日期 |
2014.08.14 |
| 申请号 |
KR20147015731 |
申请日期 |
2012.11.12 |
| 申请人 |
NIPPON STEEL & SUMIKIN CHEMICAL CO., LTD. |
发明人 |
SHIMIZU TAKEHIRO;ANDO TOSHIO;MASAKI KAZUYOSHI |
| 分类号 |
C08F2/44;C08F2/50;C08F290/00;G03H1/02;G03H1/28;G11B7/0065;G11B7/244 |
主分类号 |
C08F2/44 |
| 代理机构 |
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