发明名称 METHOD OF FORMING ORGANIC MATERIAL PATTERN USING ELECTRON BEAM
摘要 A method for forming an organic material pattern using an electron beam includes a first step of preparing a first substrate including a base material layer and a transfer layer composed of an organic material, and a second substrate to transfer the organic material pattern; a second step of stacking the first substrate on the second substrate to make the transfer layer of the first substrate face the second substrate; and a third step of emitting the electron beam to a corresponding region of the base material layer of the first substrate to form the pattern on the second substrate.
申请公布号 KR20140100292(A) 申请公布日期 2014.08.14
申请号 KR20130013424 申请日期 2013.02.06
申请人 UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY 发明人 PARK, KYU CHANG
分类号 H01L51/56;H05B33/10 主分类号 H01L51/56
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