RESIST COMPOSITION, POLYMERIC COMPOUND, COMPOUND AND METHOD OF FORMING RESIST PATTERN

摘要

A resist composition generating acid by exposure and changing the solubility thereof with respect to a developing solution by the action of the acid is provided. The resist composition includes a base component (A`), and (A`) includes a polymer compound (A1`) having a composing unit (a0) derived from a compound represented by formula (a0-1). R^1 and R^2 are a group or a functional group represented by formula (a0-2); V^1 and V^2 are independently a single bond or an alkylene group of C_1-10, etc.; Y^1 is a single bond or a divalent connecting group; Y^2 is a fluorinated alkylene group of C_1-4 including a substituent or not; L^1 is O or a group represented by -NR`^1 (R`^1 is H or an alkyl group of C_1-5); M^m^+ is an organic cation having m valency; and m is an integer greater than or equal to 1.