发明名称 MONITORING DEVICE, MONITORING SYSTEM AND MONITORING METHOD
摘要 <p>A monitoring device: measures a three-dimensional shape in the periphery of the monitoring device; estimates the self-localization of the monitoring device by collating the measured three-dimensional shape with a map for localization including the shapes and positions of structural objects inside a building excluding the shapes and positions of facility elements; extracts facility elements in the periphery of the estimated self-localization from a facility element collation map including the shapes and positions of the facility elements inside the building; extracts the shape and position of a facility element candidate from the measured three-dimensional shape; calculates a similarity between the shape and position of each of the facility elements in the periphery of the self-localization extracted from the facility element collation map and the shape and position of the facility element candidate extracted from the measured three-dimensional shape on the basis of the error distribution of the shape and position of the facility element in the periphery of the self-localization and the error distribution of the shape and position of the facility element candidate extracted from the measured three-dimensional shape; and identifies which of the facility elements in the periphery of the self-localization extracted from the facility element collation map is the facility element candidate extracted from the measured three-dimensional shape on the basis of the calculated similarity.</p>
申请公布号 EP2765386(A1) 申请公布日期 2014.08.13
申请号 EP20110871559 申请日期 2011.08.29
申请人 HITACHI, LTD. 发明人 KOGA, MASASHI
分类号 G01B11/00;G01B11/03;G06K9/00;G06T11/60;G21C17/00;H04W4/04 主分类号 G01B11/00
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