| 摘要 |
Disclosed is a steam pressure rapid heating device that can lower the crystallization temperature of an oxide film. Said steam pressure rapid heating device is provided with: a mounting platform (36) that is disposed inside a treatment chamber (34) and on which a substrate (35) is mounted; a heating mechanism (38) that heats the substrate mounted on the mounting platform; a pressurization mechanism (43) that pressurizes the inside of the treatment chamber; a steam-supply mechanism that supplies heated and pressurized steam into the treatment chamber; an evacuation mechanism (56) that evacuates the inside of the treatment chamber; and an oxygen gas supply mechanism that supplies heated and pressurized oxygen gas into the treatment chamber. |
