发明名称 Multi-MOEMS display
摘要 The Multi-MOEMS display comprises at least two MOEMS, and at least one superposition layer. All MOEMS are illuminated by beams which incide with incidence angles larger than the deflection angle onto the mirrors in their ON-state for an improved separation of illumination and reflected modulated beams. The reflected ON-beams accordingly include a zenith angle with the normal of the mirror arrays of the MOEMS. The increased angle between the illumination and the modulated beam facilitates the separation of illumination and modulated beams and diminishes the optic limitations of light energy flux through this reflection at the modulators. The Multi-MOEMS display uncovers a solution for the geometric problems of arranging multiple MOEMS and superposition layers posed by the non-normal reflection of the modulated image beams, by matching the zenith angles and the azimuth angles in the superposition image, and by a defined position of the MOEMS relative to the superposition layer.
申请公布号 US8804229(B2) 申请公布日期 2014.08.12
申请号 US201213506779 申请日期 2012.05.17
申请人 发明人 Bausenwein Bernhard Rudolf;Mayer Max
分类号 G02B26/08 主分类号 G02B26/08
代理机构 代理人
主权项 1. Multi-MOEMS display, comprising at least one light source; at least a first (1) and a second (2) micro mirror array as spatial light modulators, wherein each single micro mirror can be deflected to an OFF-state and to an ON-state, in which the normal (102) of the mirror includes an ON-deflection angle (β1) with the normal (101) of the plane (100) of the first micro mirror array; a first light guidance in which a first incident beam (11) incides on the first micro mirror array such that the axis of the incident beam (11) includes an illumination angle (δ) with the normal (102) of single mirrors of the first micro mirror array in their ON-state, the illumination angle (δ) being larger than the ON-deflection angle (β1),the first (12) ON-beam, reflected from the surface of the first micro mirror array in the ON-state includes an zenith angle (α) with the normal (101) to the plane (100) of the first micro mirror array,the normal projection (121) of the axis of the first ON-beam (12) onto the plane (100) of the first micro mirror array includes an azimuth angle φ, wherein −90°<φ≦+90°, with the rows of the first micro mirror array; a second light guidance in which a second incident beam (21) incides on the second micro mirror array such that the axis of the second incident beam (21) includes an illumination angle (δ) with the normal (202) of single mirrors of the second micro mirror array in their ON-State, which is larger than the deflection angle (β1),the second (22) ON-beam, reflected from the surface of the second micro mirror array in the ON-state, includes said zenith angle (α) with the normal (201) of the plane (200) of the second micro mirror array,the normal projection (221) of the axis of the second ON-beam (22) onto the plane (200) of the second micro mirror array includes an azimuth angle of +φ or −φ with the rows or columns of the second micro mirror array; a superposition system, comprising at least a first superposition layer (14); an arrangement of the superposition system and of the first and second micro mirror arrays in which the first superposition layer (14) is configured to reflect a portion (15) of the first ON-beam (12), and to transmit a portion (25) of the second ON-beam (22), and to reflect the portion (15) of the first ON-beam (12) into the same axis in which the portion (25) of the second ON-beam (22) transmits it; an arrangement of the superposition system and of the plane (100) of the first micro mirror array and of the plane (200) of the second micro mirror array to form a common superposition image in a common plane, whereby the plane (100) is transformed by at least the reflection at the first superposition layer (14) to the superposition image plane (150); projection optics configured to project the superposition image.
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